Nanoscale SIMS analysis: the next generation in local analysis-Reference-Cited by-同舟云学术

Nanoscale SIMS analysis: the next generation in local analysis

Published:2003-01 Issue: Volume:203-204 Page:194-197
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Nojima M,Tomiyasu B,Kanda Y,Owari M,Nihei Y

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference7 articles.

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2. J.M. Chabala, J. Bohonek, R. Levi-Setti, T.J. Maternaghan, A.N. Kriebel, in: Proceedings of the Secondary Ion Mass Spectrometry, Vol. XI, Wiley, 1997, p. 651.

3. Nanoscale elemental imaging of semiconductor materials using focused ion beam secondary ion mass spectrometry

4. B. Tomiyasu, H. Komastubara, I. Fukuju, M. Satoh, M. Owari, Y. Nihei, in: Proceedings of the Secondary Ion Mass Spectrometry, Vol. XI, Wiley, 1997, p. 1069.

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