Positive secondary ion yields under In+- and O2+-bombardement-Reference-Cited by-同舟云学术

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Positive secondary ion yields under In+- and O2+-bombardement

Published:1983-01 Issue: Volume:46 Page:503-506
ISSN:0020-7381
Container-title:International Journal of Mass Spectrometry and Ion Physics
language:en
Short-container-title:International Journal of Mass Spectrometry and Ion Physics

Author:

Gnaser H.,Rüdenauer F.G.

Publisher

Elsevier BV

Subject

Spectroscopy

Reference22 articles.

1. High‐resolution, ion‐beam processes for microstructure fabrication

2. GaAs MESFET fabrication using maskless ion implantation

3. Scanning microbeam using a liquid metal ion source

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 10.4139/sfj.59.887;Journal of The Surface Finishing Society of Japan;2008

2. Mass and energy spectra of a capillary-type indium liquid-metal ion source;International Journal of Mass Spectrometry and Ion Processes;1987-07

3. Negative secondary ion emission from oxidized surfaces;Surface Science;1984-03

4. A comparative study of methods for thin-film and surface analysis;Reports on Progress in Physics;1984-03-01

5. A comparison of SIMS with other techniques based on ion-beam solid interactions;Vacuum;1984-01

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