Quantitative SIMS analysis of nitrogen using in situ internal implantation-Reference-Cited by-同舟云学术

Quantitative SIMS analysis of nitrogen using in situ internal implantation

Published:1999-05 Issue:1-4 Volume:147 Page:14-18
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Seki S,Tamura H,Sumiya H

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference14 articles.

1. Quantitative secondary ion mass spectrometry: A review

2. R.G. Willson, F.A. Stevie, C.W. Magee, Secondary Ion Mass Spectrometry—A Practical Handbook for Depth Profiling and Bulk Impurity Analysis, Wiley, 1989.

3. H. Tamura, H. Sumiya, Y. Ikebe, S. Seki, Secondary Ion Mass Spectrometry, SIMS IX, in: A. Benninghoven, Y. Nihei, R. Shimizu, H.W. Werner (Eds.), Wiley, Chichester, 1994, p. 223.

4. Oxygen-concentration dependence of secondary ion yield enhancement

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