Electron beam lithography: resolution limits and applications-Reference-Cited by-同舟云学术

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Electron beam lithography: resolution limits and applications

Published:2000-09 Issue:1-4 Volume:164 Page:111-117
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Vieu C.,Carcenac F.,Pépin A.,Chen Y.,Mejias M.,Lebib A.,Manin-Ferlazzo L.,Couraud L.,Launois H.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference18 articles.

1. Single-electron devices and their applications

2. Patterned magnetic nanostructures and quantized magnetic disks

3. Fabrication of 5–7 nm wide etched lines in silicon using 100 keV electron‐beam lithography and polymethylmethacrylate resist

4. 10‐nm linewidth electron beam lithography on GaAs

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