Adsorption and reaction of NH3 on Ti/Si(1 0 0)-Reference-Cited by-同舟云学术

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Adsorption and reaction of NH3 on Ti/Si(1 0 0)

Published:2001-03 Issue:1-2 Volume:173 Page:95-102
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Siew H.L.,Qiao M.H.,Chew C.H.,Mok K.F.,Chan L.,Xu G.Q.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference51 articles.

1. Barrier layers: Principles and applications in microelectronics

2. Applications of TiN thin films in silicon device technology

3. Efficiency of TiN diffusion barrier between Al and Si prepared by reactive evaporation and rapid thermal annealing

4. Influence of the oxygen incorporation on the stability of Al/TiN/Si structures

5. Applicability of TiN Adhesion Layer Formed by Nitridation of Sputtered Ti Film to Blanket CVD-W Contact Filling

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