Evolution of ion implantation-caused vacancy-type defects in 6H–SiC probed by slow positron implantation spectroscopy
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference12 articles.
1. Ion Implantation in β ‐ SiC Layers Grown on (100)Si
2. Doping of 3C-SiC by implantation of nitrogen at high temperatures
3. Al and B ion‐implantations in 6H‐ and 3C‐SiC
4. Formation of Buried Layers of (SiC)1-x(AINT)x in 6H-SiC Using Ion-Beam Synthesis
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Design and Construction of a Slow Positron Beam for Solid and Surface Investigations;Defect and Diffusion Forum;2012-09
2. Single versus double ion implantation: a deep level study;physica status solidi (b);2009-02
3. Positron depth profiling in solid surface layers;Annales de chimie Science des Matériaux;2007-08-23
4. Slow positron implantation spectroscopy—a tool to characterize vacancy-type damage in ion-implanted 6H-SiC;Vacuum;2005-05
5. Vacancy-type defects in 6H–SiC caused by N+ and Al+ high fluence co-implantation;Applied Surface Science;2002-06
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