An AES study of the influence of carbon on the chemical structure of some oxide films deposited by PECVD of organosilicon precursors
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference25 articles.
1. The early stages of oxygen adsorption on silicon surfaces as seen by electron spectroscopy
2. AES and PES Studies of Semi‐Insulating Polycrystalline Silicon (SIPOS) Films
3. An AES study of damage induced by inert gas ions at SiO2 surfaces : influence of ion mass and energy
4. Auger depth profiling of silicon dioxide on silicon: A factor analysis study
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4. The effects of RF power on the interfacial property between Al2O3and Si3N4and on the memory property in a MANOS structure;Journal of Physics D: Applied Physics;2010-12-01
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