Automatically aligned electron beam lithography on the nanometre scale
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry
Reference11 articles.
1. Nanobeam process system: An ultrahigh vacuum electron beam lithography system with 3 nm probe size
2. A combined scanning electron microscope and scanning tunneling microscope for studying nanostructures
3. 250‐Å linewidths with PMMA electron resist
4. Integrated nanofabrication with the scanning electron microscope and scanning tunneling microscope
5. Monte Carlo modelling of electron-solid interactions
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