Effect of NH3 on the growth characterization of TiN films at low temperature
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference23 articles.
1. Review of CVD TiN coatings for wear-resistant applications: deposition processes, properties and performance
2. DC reactive magnetron sputter deposition of (111) textured TiN films — influence of nitrogen flow and discharge power on the texture formation
3. Electrical properties of Ti/TiN films prepared by chemical vapor deposition and their applications in submicron structures as contact and barrier materials
4. Comparison of Tetrakis(dimethylamido)titanium and Tetrakis(diethylamido)titanium as Precursors for Metallorganic Chemical Vapor Deposition of Titanium Nitride
5. Low temperature metal-organic chemical vapor deposition of advanced barrier layers for the microelectronics industry
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1. Influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering;Journal of Materials Science: Materials in Electronics;2018-04-03
2. Chemical vapor deposition of TiN on transition metal substrates;Surface and Coatings Technology;2018-01
3. Improvement in crystallinity and electrical properties of TiN thin films deposited on ZnO underlayers;Japanese Journal of Applied Physics;2014-06-05
4. The Influences of Rapid-Thermal Annealing on the Characteristics of Sr0.6Ba0.4Nb2O6 Thin Film;Journal of Nanoscience and Nanotechnology;2011-12-01
5. Effects of substrate temperatures on the crystallizations and microstructures of electron beam evaporation YSZ thin films;Journal of Alloys and Compounds;2010-06
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