New approach to low-temperature Si epitaxy by using hot wire cell method
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference7 articles.
1. Low-Temperature Epitaxial Growth ofSi/Si1-xGex/SiHeterostructure by Chemical Vapor Deposition
2. Analysis ofH2-DilutionEffects on Photochemical Vapor Deposition of Si Thin Films
3. Formation of Silicon-Based Thin Films Prepared by Catalytic Chemical Vapor Deposition (Cat-CVD) Method
4. Polycrystalline silicon films obtained by hot-wire chemical vapour deposition
5. Amorphous and microcrystalline silicon by hot wire chemical vapor deposition
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1. Polycrystalline Silicon Thin Film;Handbook of Photovoltaic Silicon;2019
2. Polycrystalline Silicon Thin Film;Handbook of Photovoltaic Silicon;2018-10-19
3. Surface morphology control of epitaxial silicon films grown by hot wire chemical vapor deposition using hydrogen dilution;Solar Energy Materials and Solar Cells;2010-03
4. A Phase Diagram for Morphology and Properties of Low Temperature Deposited Polycrystalline Silicon Grown by Hot-wire Chemical Vapor Deposition;MRS Proceedings;2004
5. Characterization of low temperature epitaxial Si and Si1−yCy films grown by hot wire cell method;Materials Science and Engineering: B;2002-02
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