Aluminium incorporation for growth optimization of 1.3μm emission InAs/GaAs quantum dots by molecular beam epitaxy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference13 articles.
1. Low-threshold oxide-confined 1.3-μm quantum-dot laser
2. High frequency characteristics of InAs/GaInAs quantum dot distributed feedback lasers emitting at 1.3 [micro sign]m
3. Very low threshold current density room temperature continuous-wave lasing from a single-layer InAs quantum-dot laser
4. GaAs-based long-wavelength lasers
5. Shape transition in growth of strained islands: Spontaneous formation of quantum wires
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1. X-ray mapping in a scanning transmission electron microscope of InGaAs quantum dots with embedded fractional monolayers of aluminium;Semiconductor Science and Technology;2020-06-23
2. Strain relaxation in InAs quantum dots through capping layer variation and its impact on the ultrafast carrier dynamics;Semiconductor Science and Technology;2019-08-27
3. Effects of ultra-low Al alloying In(Al)As layer on the formation and evolution of InAs/GaAs quantum dots;Journal of Applied Physics;2011-05
4. High density patterned quantum dot arrays fabricated by electron beam lithography and wet chemical etching;Applied Physics Letters;2008-09-15
5. Metalorganic vapor phase epitaxy growth of AlGaInAs quantum dots on (100) GaAs substrate;Journal of Crystal Growth;2004-09
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