Growth characteristics of GaInN on (0001)sapphire by plasma-excited organometallic vapor phase epitaxy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference22 articles.
1. Candela‐class high‐brightness InGaN/AlGaN double‐heterostructure blue‐light‐emitting diodes
2. Superbright Green InGaN Single-Quantum-Well-Structure Light-Emitting Diodes
3. Continuous‐wave operation of InGaN multi‐quantum‐well‐structure laser diodes at 233 K
4. Effects of ain buffer layer on crystallographic structure and on electrical and optical properties of GaN and Ga1−xAlxN (0 < x ≦ 0.4) films grown on sapphire substrate by MOVPE
5. GaN Growth Using GaN Buffer Layer
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Optical polarization properties of (11–22) semi-polar InGaN LEDs with a wide spectral range;Scientific Reports;2020-04-28
2. Monolithically integrated white light LEDs on (11–22) semi-polar GaN templates;Scientific Reports;2019-02-04
3. Low-temperature growth of GaN by remote-plasma-enhanced organometallic vapor-phase epitaxy;Journal of Crystal Growth;2000-12
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