Microscopic strain analysis of semiconductor crystals using a synchrotron X-ray microbeam-Reference-Cited by-同舟云学术

Microscopic strain analysis of semiconductor crystals using a synchrotron X-ray microbeam

Published:2002-04 Issue: Volume:237-239 Page:317-323
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Matsui J.,Tsusaka Y.,Yokoyama K.,Takeda S.,Urakawa M.,Kagoshima Y.,Kimura S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference20 articles.

1. A micro‐fluorescent/diffracted x‐ray spectrometer with a micro‐x‐ray beam formed by a fine glass capillary

2. Synchrotron x-ray microdiffraction diagnostics of multilayer optoelectronic devices

3. Formation of Parallel X-Ray Microbeam and Its Application

4. Figure-8 undulator as an insertion device with linear polarization and low on-axis power density

5. J. Matsui, Y. Kagoshima, Y. Tsusaka, Y. Katsuya, M. Motoyama, Y. Watanabe, K. Yokoyama, K. Takai, S. Takeda, J. Chikawa, SPring-8 Annual Report 1997, Japan Synchrotron Radiation Research Institute, Hyogo, 1998, p. 125.

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