Effect of surface treatments on interfacial adhesion energy between UV-curable resist and glass wafer-Reference-Cited by-同舟云学术

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Effect of surface treatments on interfacial adhesion energy between UV-curable resist and glass wafer

Published:2009-09 Issue:6 Volume:29 Page:662-669
ISSN:0143-7496
Container-title:International Journal of Adhesion and Adhesives
language:en
Short-container-title:International Journal of Adhesion and Adhesives

Author:

Jang Eun-Jung,Park Young-Bae,Lee Hak-Joo,Choi Dae-Geun,Jeong Jun-Ho,Lee Eung-Sug,Hyun Seungmin

Publisher

Elsevier BV

Subject

Polymers and Plastics,General Chemical Engineering,Biomaterials

Reference16 articles.

1. Imprint of sub-25nm vias and trenches in polymers;Chou;Appl Phys Lett,1995

2. Multi-layered resist process in nanoimprint lithography for high aspect ratio pattern;Konishi;Microelectron Eng,2006

3. Trend of nanoimprint lithography technology;Jeong;J Korean Soc Precis Eng,2003

4. Analyses of mechanical failure in nanoimprint processes;Hsueh;Mater Sci Eng,2006

5. Fluorinated organic–inorganic hybrid mold as a new stamp for nanoimprint and soft lithography;Choi;Langmuir,2005

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