Recent progress in synchrotron radiation lithography-Reference-Cited by-同舟云学术

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Recent progress in synchrotron radiation lithography

Published:1996-05 Issue: Volume:80 Page:321-327
ISSN:0368-2048
Container-title:Journal of Electron Spectroscopy and Related Phenomena
language:en
Short-container-title:Journal of Electron Spectroscopy and Related Phenomena

Author:

Deguchi Kimiyoshi,Miyoshi Kazunori,Matsuda Tadahito

Publisher

Elsevier BV

Subject

Physical and Theoretical Chemistry,Spectroscopy,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Radiation,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Application of synchrotron radiation to x‐ray lithography

2. Fabrication of high performance 512K static-random access memories in 0.25 μm complementary metal–oxide semiconductor technology using x-ray lithography

3. NTT superconducting storage ring—Super‐ALIS

4. High efficiency beamline for synchrotron radiation lithography

5. A vertical stepper for synchrotron x-ray lithography

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. X-ray Lithography;Nano-Lithography;2013-03-07

2. SiC x-ray lithography mask fabricated by electron cyclotron resonance plasma source coupled with divided microwaves;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-05

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