Simplified laser system for the generation of 60 fs pulses at 248 nm
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Physical and Theoretical Chemistry,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference18 articles.
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3. Subpicosecond KrF* excimer-laser source
4. Ultrafast ultraviolet pump–probe apparatus
5. Bandwidth limited amplification of 220 fs pulses in XeCl
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