Reactivity and mechanism in the chemical vapour deposition of late transition metals
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Physical and Theoretical Chemistry
Reference109 articles.
1. New metallo-organic precursors for surface processing
2. Laser-assisted deposition of thin films from gas-phase and surface-adsorbed molecules
3. Deposition of optical coatings by laser-assisted evaporation and by photo-assisted chemical vapor deposition
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