Quaternary evolution of a hyperarid drainage under climatic fluctuations and rift-margin base-level fall, NE Negev, Israel
Author:
Funder
Israel Science Foundation
Publisher
Elsevier BV
Subject
Earth-Surface Processes
Reference109 articles.
1. Introduction to Optical Dating: The Dating of Quaternary Sediments by the Use of Photon-Stimulated Luminescence;Aitken,1998
2. The evolution of Holocene reg (gravelly) soils in deserts. An example from the dead sea region;Amit;Catena,1986
3. Stages and rate of the gravel shattering process by salts in desert Reg soils;Amit;Geoderma,1993
4. Permanent Quaternary hyperaridity in the Negev, Israel, resulting from regional tectonics blocking Mediterranean frontal systems;Amit;Geology,2006
5. The role of rare rainstorms in the formation of calcic soil horizons on alluvial surfaces in extreme deserts;Amit;Quat. Res.,2010
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Century‐scale sequences and density‐flow deltas of the late Holocene and modern Dead Sea coast, Israel;Sedimentology;2023-06-25
2. Denudation of the Golan Heights basaltic terrain using in-situ 36Cl and OSL dating;Geomorphology;2023-06
3. Estimating the Age of Abandoned Alluvial Surfaces Using Morphologic Dating of Gully Incision;Journal of Geophysical Research: Earth Surface;2023-03
4. fluvial responses to external and internal forcing: Upper Holocene dynamics in a low latitude semi-arid region in South America;Journal of South American Earth Sciences;2021-12
5. Chrono-sequences of alluvial terraces and fossilized water bodies as a predictive model for detecting Lower and Middle Palaeolithic sites in the Negev desert, Israel;Quaternary Science Reviews;2021-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3