Two-layer film flow on a rotating disk: A numerical study
Author:
Publisher
Elsevier BV
Subject
Applied Mathematics,Mechanical Engineering,Mechanics of Materials
Reference20 articles.
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2. Characteristic of resist films produced by spinning;Meyerhofer;J. Appl. Phys.,1978
3. An investigation of spin coating of electron resists;Lai;Polym. Eng. Sci.,1979
4. Investigation of the solvent-evaporation effect on spin coating of thin films;Chen;Polym. Eng. Sci.,1983
5. The effect of air shear on the flow thin liquid film over a rough rotating disk;Ma;J. Appl. Phys.,1990
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