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Monte Carlo simulation of high rate reactive sputtering of tin oxide in planar d.c. magnetron systems

  • Published:1992-10 Issue:1-2 Volume:219 Page:270-277
  • ISSN:0040-6090
  • Container-title:Thin Solid Films
  • language:en
  • Short-container-title:Thin Solid Films

Author:

Tsiogas C.D.,Avaritsiotis J.N.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A comparative study of interatomic potentials for copper and aluminum gas phase sputter atom transport simulations;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2003-04

2. On the electronic interaction between additives and semiconducting oxide gas sensors;Applied Physics Letters;1996-07-29

3. Comparative study of various metal-oxide-based gas-sensor architectures;Sensors and Actuators B: Chemical;1996-04

4. A model for the gas sensing properties of tin oxide thin films with surface catalysts;Sensors and Actuators B: Chemical;1995-10

5. The effect of film oxygen content on SnOitx gas-sensor selectivity;Sensors and Actuators B: Chemical;1995-04
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