Evaluation of tetra-alkylchromium precursors for organometallic chemical vapor deposition II: Unusual low temperature chromium carbide deposition from Cr[C(CH3)3]4-Reference-Cited by-同舟云学术

Evaluation of tetra-alkylchromium precursors for organometallic chemical vapor deposition II: Unusual low temperature chromium carbide deposition from Cr[C(CH3)3]4

Published:1992-10 Issue:1-2 Volume:219 Page:24-29
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Maury F.,Ossola F.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference35 articles.

1. Influence of organochromium precursor chemistry on the microstructure of MOCVD chromium carbide coatings

2. F. Maury, Appl. Organomet. Chem., in the press.

3. Low Temperature Deposition of Metal Nitrides by Thermal Decomposition of Organometallic Compounds

4. Chemical vapour deposition of transition-metal silicides by pyrolysis of silyl transition-metal carbonyl compounds

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