Transmission electron microscopy studies of the polycrystalline silicon-SiO2 interface

Author:

Bravman J.C.,Sinclair R.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Cited by 25 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. Effects of N2O Plasma Treatment on the Performance of Excimer-Laser-Annealed Polycrystalline Silicon Thin Film Transistors;Japanese Journal of Applied Physics;2002-09-15

4. Oxidation;Polycrystalline Silicon for Integrated Circuits and Displays;1998

5. Oxidation of Silicon Using Electron Cyclotron Resonance Nitrous Oxide Plasma and Its Application to Polycrystalline Silicon Thin Film Transistors;Journal of The Electrochemical Society;1997-09-01

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