Charge distribution in metal/A12O3/SiO2/Si structures
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference6 articles.
1. Conduction and charging behavior in the MA(O)S system;Kampshoff;J. Electrochem. Soc.,1977
2. Silicon nitride trap properties as revealed by charge centroid measurements on MNOS devices;Arnett;Appl. Phys. Lett.,1975
3. Direct display of electron back tunneling in MNOS memory capacitors;Yun;Appl. Phys. Lett.,1973
4. MNOS charge versus centroid determination by staircase charging;Lehovec;IEEE Trans. Electron Devices,1978
5. Schaltverhalten von MIOS-Festwertspeichern;El-Dessouky,1979
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Injection spectroscopy of localized states in thin insulating layers on semiconductor surfaces;Progress in Surface Science;1994-12
2. Charge trapping in MIOS memory structures under positive and negative biasing;International Journal of Electronics;1994-02
3. Electrical breakdown of aluminum oxide films flanked by metallic electrodes;Journal of Applied Physics;1982-08
4. Charge centroid in MIOS nonvolatile memory structures;IEEE Transactions on Electron Devices;1982-05
5. Charge profile in thin layers of Al2O3;Journal of Applied Physics;1982-03
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