Electrical characteristics of sputtered chromium silicide films-Reference-Cited by-同舟云学术

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Electrical characteristics of sputtered chromium silicide films

Published:1986-04 Issue:1 Volume:138 Page:L59-L61
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Gónzalez J.P.,Fernández M.,Martínez-Duart J.M.,Gómez C.,Albella J.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Structural and electrical properties of CrSi2 thin film resistors

2. Amorphous chromium-silicon: A material for kilo-ohm sheet resistances

3. The properties of Cr–Si–O thin film resistors by dc conventional sputtering

4. Electrical properties of 70wt.%Cr-30wt.%SiO thin films

5. CrSi resistive films produced by magnetron-plasmatron sputtering

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of the Argon Pressure at dc Magnetron Sputtering on Contaminations in CrSi Thin Films;Contributions to Plasma Physics;1992

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