Effect of N2Ar mixing on the reactive sputtering characteristics of silicon
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference10 articles.
1. Thin Film Processes;Vossen,1978
2. Charge Phenomena in dc Reactively Sputtered SiO2 Films
3. Dielectric Properties of Reactively Sputtered Films of Aluminum Nitride
4. Effect of Reactant Nitrogen Pressure on the Microstructure and Properties of Reactively Sputtered Silicon Nitride Films
5. Deposition of magnetite films by reactive sputtering of iron
Cited by 60 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-09
2. High-Pressure and Reactive Gas Magnetron Sputtering;Gas-Phase Synthesis of Nanoparticles;2017-03-03
3. The existence of a double S-shaped process curve during reactive magnetron sputtering;Applied Physics Letters;2016-09-12
4. Applying "the upgraded Berg model" to predict hysteresis free reactive sputtering;Surface and Coatings Technology;2016-03
5. Applying “the upgraded Berg model” to predict hysteresis free reactive sputtering;Surface and Coatings Technology;2015-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3