Preparation of SixCyHz films from methylsilane by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Preparation of SixCyHz films from methylsilane by plasma-enhanced chemical vapor deposition

Published:1991-07 Issue:2 Volume:202 Page:289-298
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Delplancke M.P.,Powers J.M.,Vandentop G.J.,Somorjai G.A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference46 articles.

1. SiC film formation on Si(001) by reaction with C2H2 beams

2. Chemically-formed buffer layers for growth of cubic silicon carbide on silicon single crystals

3. Parametric study of silicon carbide coatings deposited in a fluidized bed

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1. Dominance of Silylene Chemistry in the Decomposition of Monomethylsilane in the Presence of a Heated Metal Filament;The Journal of Physical Chemistry A;2014-05-21

2. Formation of Methyl Radicals from Decomposition of Methyl-Substituted Silanes over Tungsten and Tantalum Filament Surfaces;The Journal of Physical Chemistry A;2013-08-02

3. Selective effect of ion/surface interaction in low frequency PACVD of SIC:H films: Part B. Microstructural study;Surface and Coatings Technology;2006-09

4. Selective effect of ion/surface interaction in low frequency PACVD of SiC:H films: Part A. Gas phase considerations;Surface and Coatings Technology;2005-10

5. Adsorption of silane and methylsilane on gold surfaces;Surface Science;2004-12

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