The role of reactive diffusion in the growth kinetics of the icosahedral quasicrystalline Al4Mn phase: case of sequentially deposited thin films-Reference-Cited by-同舟云学术

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The role of reactive diffusion in the growth kinetics of the icosahedral quasicrystalline Al4Mn phase: case of sequentially deposited thin films

Published:1995-12 Issue:1-2 Volume:271 Page:26-34
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zsigmond G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference33 articles.

1. P.M. D'Heurle, in B.Fultz,R.W. Cahn and D. Gupta (eds.), Diffusion in Ordered Alloys and Intermetallic Compounds, FMS, Warrendale, PA, to be published.

2. A review of thin-film aluminide formation

3. Atom Movements: Diffusion and Mass Transport in Solids;Philibert,1991

4. Phase Transformation Kinetics in Thin Films,1992

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Energetics of nucleation for the icosahedral Al-Mn phase in HTSD-deposited thin films;Structural Chemistry;2002

2. Reactivity of amorphous and intermetallic Al–Pt phases with Pt vapour beam;Solid State Ionics;2001-05

3. Composition of a solid phase growing under nonequilibrium conditions;Journal of Applied Physics;2000-05-15

4. Icosahedral Al–Mn phases grown in diffusion-limited conditions;Thin Solid Films;2000-02

5. Detailed model on amorphous Al-Pt phase growth in thin film systems;Surface and Coatings Technology;1998-03

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