A review of thin-film aluminide formation-Reference-Cited by-同舟云学术

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A review of thin-film aluminide formation

Published:1990-01 Issue:1 Volume:5 Page:1-44
ISSN:0920-2307
Container-title:Materials Science Reports
language:en
Short-container-title:Materials Science Reports

Author:

Colgan E.G.

Publisher

Elsevier BV

Subject

General Engineering

Reference128 articles.

1. VLSI Technology;Fraser,1983

2. Diffusion barriers in thin films

3. Diffusion Phenomena in Thin Films and Microelectronic Materials;Kattelus,1988

4. Barrier layers: Principles and applications in microelectronics

5. Thin Films — Interdiffusion and Reaction;Rosenberg,1978

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