Strain, ion bombardment and energetic neutrals in magnetron sputtering-Reference-Cited by-同舟云学术

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Strain, ion bombardment and energetic neutrals in magnetron sputtering

Published:1989-04 Issue:1 Volume:171 Page:183-196
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Window B.,Müller K.-H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Simulation of structural anisotropy and void formation in amorphous thin films

2. Columnar microstructure in vapor-deposited thin films

3. Stress and microstructure of sputter‐deposited thin films: Molecular dynamics investigations

4. Aluminum films deposited by rf sputtering

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