Electrical properties and structure of boron-doped sputter-deposited polycrystalline silicon films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference22 articles.
1. Structure of chemically deposited polycrystalline-silicon films
2. Electrical characteristics of boron diffused polycrystalline silicon layers
3. The electrical properties of polycrystalline silicon films
4. Silicon gate technology
5. Metal-nitride-oxide-silicon field-effect transistors, with self-aligned gates
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2. Characteristics of Thin-Film Transistors Fabricated on Fluorinated Zinc Oxide;IEEE Electron Device Letters;2012-04
3. Solution growth of silicon on Al-Si coated quartz glass substrates;Materials Letters;1994-03
4. Magnetron‐Sputtered Silicon Films for Gate Electrodes in MOS Devices;Journal of The Electrochemical Society;1987-06-01
5. Properties of Thin Films for Solar Cells;Thin Film Solar Cells;1983
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