IR spectroscopic ellipsometry: instrumentation and applications in semiconductors-Reference-Cited by-同舟云学术

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IR spectroscopic ellipsometry: instrumentation and applications in semiconductors

Published:1993-10 Issue:1-2 Volume:234 Page:356-362
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Zalczer Gilbert,Thomas Olivier,Piel Jean-Philippe,Stehlé Jean-Louis

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Infrared Spectroscopic Ellipsometry;Roeseler,1990

2. Ellipsometry and Polarized Light;Azzam,1977

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High Performance Fourier Transform IR Ellipsometer;Fourier Transform Spectroscopy;2022

2. Highly tolerant a-Si distributed Bragg reflector fabricated by oblique angle deposition;Optical Materials Express;2011-06-24

3. Broadband laser mirrors made from porous silicon;Applied Physics Letters;2004-05-03

4. Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI;Thin Solid Films;2004-05

5. Infrared spectroscopic ellipsometry applied to the characterization of nano-structures of silicon IC manufacturing;Thin Solid Films;2004-02

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