Krypton entrapment in pulse-biased sputter-deposited metals-Reference-Cited by-同舟云学术

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Krypton entrapment in pulse-biased sputter-deposited metals

Published:1978-11 Issue:3 Volume:54 Page:327-336
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Bayne M.A.,Moss R.W.,Mcclanahan E.D.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference10 articles.

1. Nuclear power production and estimated85Kr levels;Coleman;Radiol. Health Data Rep.,1966

2. Environmental radiation protection standards for nuclear power operations;Fed. Regist.,1977

3. Separation, storage and disposal of krypton-85 status and projects;Laser,1976

4. Mechanism of Inert Gas Cleanup in a Gaseous Discharge

5. The storage of inert gases in a metallic matrix by combined ion implantation and sputtering;Whitmell,1977

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Sputtering;digital Encyclopedia of Applied Physics;2003-04-15

2. Production of thin films by controlled deposition of sputtered material;Topics in Applied Physics;1991

3. Modification of the grain size of sputtered copper with additions of oxygen, krypton, silver, or yttrium;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1985-11

4. Influence of Erosion and Redeposition Processes on the Lifetime of Impurity Control Components: An Assessment for TiC Coatings;Fusion Technology;1984-09

5. Influence of composition and substrate bias on structure and inert gas content of sputter‐deposited Ni–La alloys;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1983-04

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