Production of thin films by controlled deposition of sputtered material-Reference-Cited by-同舟云学术

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Production of thin films by controlled deposition of sputtered material

Published:1991 Issue: Volume: Page:339-377
ISSN:0303-4216
Container-title:Topics in Applied Physics
language:
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Author:

McClanahan Edwin D.,Laegreid Nils

Publisher

Springer Berlin Heidelberg

Link

http://link.springer.com/content/pdf/10.1007/3540534288_21.pdf

Reference142 articles.

1. W.R. Grove: Phil. Trans. Roy. Soc. London 142, 87 (1852)

2. J. Plücker: Pogg. Ann. 103, 88 (1858)

3. A.W. Wright: Am. J. Sci. Arts 13, 49 (1877)

4. G.K. Wehner, G.S. Anderson: In Handbook of Thin Filin Technology, ed. by L.I. Maissel, R. Glang (McGraw-Hill, New York 1970), Chap. 3

5. L.M. Reiber, J. Lantaires: Le Vide 168 (1973)

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1. Different Types of Thin Film Deposition Techniques and Application;Handbook of Emerging Materials for Semiconductor Industry;2024

2. Substrate Effects of Noble Metal Nanostructures Prepared by Sputtering;Noble and Precious Metals - Properties, Nanoscale Effects and Applications;2018-07-04

3. Deposition and Patterning Technologies;Ferroelectric Dielectrics Integrated on Silicon;2013-02-27

4. Hydrogen Palladium Selective Membranes: An Economic Perspective;Membrane Reactors for Hydrogen Production Processes;2011

5. Sputtering: survey of observations and derived principles;Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences;2003-11-25

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