A closed system fabrication of chromium silicide thin film resistors-Reference-Cited by-同舟云学术

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A closed system fabrication of chromium silicide thin film resistors

Published:1984-11 Issue:3 Volume:121 Page:259-262
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Karulkar Pramod C.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Sputtered Silicon–Chromium Resistive Films

2. Hall Effect in Silicon‐Chromium Films

3. 29th Natl. Vacuum Symp.;Karulkar,1982

4. Structural and electrical properties of CrSi2 thin film resistors

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Co-sputtered Si-Cr resistive films;Journal of Materials Science;1987-10

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