A kinematic analysis of disk motion in a double sided polisher for chemical mechanical planarization (CMP)-Reference-Cited by-同舟云学术

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A kinematic analysis of disk motion in a double sided polisher for chemical mechanical planarization (CMP)

Published:2008-02 Issue:2 Volume:41 Page:111-118
ISSN:0301-679X
Container-title:Tribology International
language:en
Short-container-title:Tribology International

Author:

Kasai Toshi

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials

Reference33 articles.

1. The theory and design of plate glass polishing machines;Preston;J Soc Glass Technol,1927

2. Chemical Mechanical Planarization of Microelectronic Materials;Steigerwald,1997

3. Contact and rubbing of flat surfaces;Archard;J Appl Phys,1953

4. Principles of Tribology,1987

5. Comments on the sliding of metals;Rigney;Tribol Int,1997

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