Thin film deposition of Mo and Mo-compounds by PECVD from Mo(CO)6 and MoF6 as precursors: characterization of films and thermodynamic analysis
Author:
Publisher
Elsevier BV
Subject
Electrochemistry,General Chemical Engineering,Analytical Chemistry
Reference22 articles.
1. The Reactive Ion Etching of Molybdenum and Bilayer Metallization Systems Containing Molybdenum
2. Chemical Vapor Deposition of Tungsten Carbide, Molybdenum Carbide Nitride, and Molybdenum Nitride Films
3. R. Loutfy, MER Corporation, Tucson, AZ, private communication, 1996.
4. Study of sputtered molybdenum nitride as a diffusion barrier
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