Non uniformities of silicon oxide films grown in peroxide mixtures
Author:
Publisher
Elsevier BV
Subject
Electrochemistry,General Chemical Engineering,Analytical Chemistry
Reference29 articles.
1. Handbook of Semiconductor Wafer Cleaning Technology,1993
2. Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces
3. Dry Cleaning for Fe Contaminants on Si and SiO2 Surfaces with Silicon Chlorides
4. Control of SC1 Wet Cleaning Process for Nano-Scale Gate Oxide Integrity
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