Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces-Reference-Cited by-同舟云学术

Megasonic Excited Ozonized Water for the Cleaning of Silicon Surfaces

Published:1997-04-01 Issue:4 Volume:144 Page:1482-1487
ISSN:0013-4651
Container-title:Journal of The Electrochemical Society
language:
Short-container-title:J. Electrochem. Soc.

Author:

Ojima Senri¹,Kubo Kazuki¹,Kato Masayuki²,Toda Masayuki²,Ohmi Tadahiro¹

Affiliation:

1. Department of Electronics, Faculty of Engineering, Tohoku University, Aza Aoba, Aramaki, Aoba‐ku, Sendai 980, Japan

2. Department of Materials Science and Engineering, Faculty of Engineering, Yamagata University, 3‐16, Jonan 4 chome, Yonezawa, Japan

Publisher

The Electrochemical Society

Subject

Materials Chemistry,Electrochemistry,Surfaces, Coatings and Films,Condensed Matter Physics,Renewable Energy, Sustainability and the Environment,Electronic, Optical and Magnetic Materials

Link

https://iopscience.iop.org/article/10.1149/1.1837616/pdf

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