Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA-Reference-Cited by-同舟云学术

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Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA

Published:2018-02 Issue: Volume:177 Page:464-470
ISSN:0009-2509
Container-title:Chemical Engineering Science
language:en
Short-container-title:Chemical Engineering Science

Author:

Psarellis George M.,Aviziotis Ioannis G.,Duguet Thomas,Vahlas Constantin,Koronaki Eleni D.,Boudouvis Andreas G.

Funder

National Scholarship Foundation of Greece

Institut Français du Petrole et des Energies Nouvelles

European Integrated Center for the Development of New Metallic Alloys and Compounds

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference40 articles.

1. Alkyl dichloroacetates: a novel application in the preparation of highly functionalised aziridines from imines;Aitken;J. Organomet. Chem.,1985

2. Al-Cu intermetallic coatings processed by sequential metalorganic chemical vapor deposition and post deposition annealing;Aloui;Appl. Surf. Sci.,2012

3. Planarized multilevel interconnection using chemical mechanical polishing of selective CVD–Al via plugs;Amazawa;IEEE Trans. Electron Dev.,1998

4. Ansys/Fluent v12.1sp1. Documentation. Ansys Inc., 2009.

5. Al13Fe4 as a low-cost alternative for palladium in heterogeneous hydrogenation;Armbrüster;Nat. Mater.,2012

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