Regulation of film thickness, surface roughness and porosity in thin film growth using deposition rate

Author:

Hu Gangshi,Orkoulas Gerassimos,Christofides Panagiotis D.

Publisher

Elsevier BV

Subject

Applied Mathematics,Industrial and Manufacturing Engineering,General Chemical Engineering,General Chemistry

Reference31 articles.

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4. Stochastic model for surface erosion via ion sputtering: dynamical evolution from ripple morphology to rough morphology;Cuerno;Physical Review Letters,1995

5. The surface statistics of a granular aggregate;Edwards;Proceedings of the Royal Society of London Series A—Mathematical Physical and Engineering Sciences,1982

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