Depth profiling a near surface carbon contaminant in implanted first wall materials-Reference-Cited by-同舟云学术

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Depth profiling a near surface carbon contaminant in implanted first wall materials

Published:1976-12 Issue: Volume:63 Page:477-481
ISSN:0022-3115
Container-title:Journal of Nuclear Materials
language:en
Short-container-title:Journal of Nuclear Materials

Author:

Panitz J.A.

Publisher

Elsevier BV

Subject

Nuclear Energy and Engineering,General Materials Science,Nuclear and High Energy Physics

Reference5 articles.

1. The crystallographic distribution of field-desorbed species

2. Field-ion microscopy principles and applications;Müller,1969

3. CRC Crit. Rev. in Solid State Sciences;Panitz,1975

4. Field-ion microscopy,1968

5. Annealing Studies of Irradiated Platinum

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atom probe field-ion microscopy: A technique for microstructural characterization of irradiated materials on the atomic scale;Metallurgical Transactions A;1989-12

2. Vitreous ice as a cryoprotectant for imaging atom‐probe studies of adsorption phenomena at a solid–liquid interface;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1989-07

3. Surface analysis of field‐ion samples exposed to the plasma of the impurities studies experiment (ISX‐A) tokamak;Applied Physics Letters;1979-07-15

4. The application of high-field surface analytical techniques to the study of plasma-wall interactions in PLT;Applications of Surface Science;1979-07

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