Nitridation of Sio2thin films in low ammonia pressures: An AES, SIMS, XPS and Raman spectroscopy investigation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference54 articles.
1. Semiconductor Silicon;Lai,1981
2. Photoluminescence Processes of Zn-Doped In1-xGaxP with 0.6
3. Thermal nitridation of Si and SiO2for VLSI
4. Advantages of thermal nitride and nitroxide gate films in VLSI process
5. Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET's
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4. Chapter 1 Silica, silicon nitride and oxynitride thin films;New Insulators, Devices and Radiation Effects;1999
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