Oxygen adsorption on Ge(111) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference36 articles.
1. Oxidation of Clean Ge and Si Surfaces
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3. The adsorption of oxygen on a clean silicon surface
4. Ellipsometry in the sub-monolayer region
5. Ellipsometry and the clean surfaces of silicon and germanium
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2. In situ synchrotron radiation photoemission study of ultrathin surface oxides of Ge(111)-c(2 × 8) induced by supersonic O2beams;Applied Physics Express;2015-01-26
3. In-situ non-disruptive cleaning of Ge(100) using H2O2(g) and atomic hydrogen;Surface Science;2014-12
4. Plasma-oxidation of Ge(100) surfaces using dielectric barrier discharge investigated by metastable induced electron spectroscopy, ultraviolet photoelectron spectroscopy, and x-ray photoelectron spectroscopy;Journal of Applied Physics;2011-08
5. The influence of lattice oxygen on the initial growth behavior of heteroepitaxial Ge layers on single crystalline PrO2(111)∕Si(111) support systems;Journal of Applied Physics;2008-04-15
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