A SLAB-MINDO study of half monolayer and monolayer chemisorption of chlorine on the silicon (001) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference31 articles.
1. Surface science aspects of etching reactions
2. GaAs and AlGaAs anisotropic fine pattern etching using a new reactive ion beam etching system
3. Reactive ion etching of GaAs, AlGaAs, and GaSb in Cl2 and SiCl4
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2. Atomic processes during Cl supersaturation etching ofSi(100)−(2×1);Physical Review B;2009-03-06
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