A new application of soft X-ray spectroscopy to a non-destructive analysis of a film/substrate contact system: Carbonized-layer (ultra-thin-film)/Si(100)-Reference-Cited by-同舟云学术

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A new application of soft X-ray spectroscopy to a non-destructive analysis of a film/substrate contact system: Carbonized-layer (ultra-thin-film)/Si(100)

Published:1988-01 Issue:3 Volume:199 Page:467-475
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Iwami M.,Kusaka M.,Hirai M.,Nakamura H.,Shibahara K.,Matsunami H.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference10 articles.

1. X-ray Spectroscopy;Azaroff,1974

2. Silicon Carbide — A High Temperature Semiconductor,1960

3. Blue-Emitting Diodes of 6H-SiC Prepared by Chemical Vapor Deposition

4. IVA-8 heteroepitaxial growth of cubic silicon carbide on foreign substrates

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1. Non-destructive Analysis of Buried Interfaces and Surface Layers: X-Ray Emission Spectroscopic Study;Japanese Journal of Applied Physics;2003-07-30

2. BURIED INTERFACES OF HEAT-LOADED Mo/Si MULTILAYERS STUDIED BY SOFT-X-RAY EMISSION SPECTROSCOPY;Surface Review and Letters;2002-04

3. Study of the NiTi/SiO2 interface: analysis of the electronic distributions;Surface and Interface Analysis;2002

4. Effect of argon etching on alumina surfaces and on Pt/alumina interfaces;Applied Surface Science;2001-10

5. Silicon carbide: fundamentals;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2001-07

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