The quantitative compositional analysis and field-evaporation behavior of ordered Ni4Mo on an atomic plane-by-plane basis: An atom-probe field-ion microscope study-Reference-Cited by-同舟云学术

The quantitative compositional analysis and field-evaporation behavior of ordered Ni4Mo on an atomic plane-by-plane basis: An atom-probe field-ion microscope study

Published:1983-07 Issue:2-3 Volume:129 Page:281-300
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Yamamoto Masahiko,Seidman David N.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference28 articles.

1. Range Profiles of 300- and 475-eVHe+4Ions and the Diffusivity ofHe4in Tungsten

2. Range profiles of low-energy (100 to 1500 eV) implanted3He and4He atoms in tungsten I. Experimental results

3. Range profiles of low-energy (100 to 1500 eV) implanted3He and4He atoms in tungsten II. Analysis and discussion

4. The Crystal Structure of Ni4Mo

5. Field ion microscopy of Ni-Mo alloys

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