Oxide thickness measurements up to 120 Å on silicon and aluminum using the chemically shifted auger spectra-Reference-Cited by-同舟云学术

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Oxide thickness measurements up to 120 Å on silicon and aluminum using the chemically shifted auger spectra

Published:1977-12 Issue:2 Volume:69 Page:385-402
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Chang C.C.,Boulin D.M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference30 articles.

1. Analytical Auger Electron Spectroscopy;Chang,1974

2. General formalism for quantitative Auger analysis

3. C.C. Chang and G.A. Rozgonyi, unpublished report.

4. Symp. Proc., Ellipsometry in the Measurement of Surfaces and Thin Films;Winterbottom,1964

5. Spectroscopic Ellipsometry of Solids;Aspnes,1975

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