Oxidation stages of clean and H-terminated Si(001) surfaces at room temperature
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference17 articles.
1. The interaction of molecular and atomic oxygen with Si(100) and Si(111)
2. Oxidation of clean and H-passivated Si(111) surfaces
3. Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study
4. Adsorption of atomic oxygen (N2O) on a clean Si(100) surface and its influence on the surface state density; A comparison with O2
5. Direct measurement of reaction kinetics for the decomposition of ultrathin oxide on Si(001) using scanning tunneling microscopy
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