A study of the oxidation of tantalum nitride by ellipsometry and auger electron spectroscopy-Reference-Cited by-同舟云学术

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A study of the oxidation of tantalum nitride by ellipsometry and auger electron spectroscopy

Published:1976-06 Issue: Volume:56 Page:482-487
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Adams J.R.,Kramer D.K.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference5 articles.

1. Thin Film Technology;Berry,1968

2. R.A. Langley, Sandia Laboratories, to be published.

3. Selected area and in-depth auger analysis of thin films

4. Parameter-Correlation and Computational Considerations in Multiple-Angle Ellipsometry*

5. Thermal Oxidation of Sputtered Tantalum Thin Films between 100° and 525°C

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1. Multicomponent bulk metal nitride (Nb1/3Ta1/3Ti1/3)N1−δsynthesis via reaction flash sintering and characterizations;Journal of the American Ceramic Society;2020-06

2. Optical Interference During rf-GDOES Depth Profiling of Anodized Aluminum-Tantalum Alloy Films;Journal of Materials Engineering and Performance;2013-03-19

3. Nanoindentation Methods in Interfacial FractureTesting;Comprehensive Structural Integrity;2003

4. Nanoindentation Methods in Interfacial Fracture Testing;Comprehensive Structural Integrity;2003

5. Neutron reflectivity investigation of the effects of harsh environments on Ta2N thin films;Thin Solid Films;1999-06

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