SiH4 on TiSi2: an investigation of gas adsorption on metal-like compounds
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference42 articles.
1. Self-aligned silicides or metals for very large scale integrated circuit applications
2. Chemical vapour deposition of metal silicides in silicon microelectronics
3. Detailed in-situ monitoring of film growth: application to TiSi2 chemical vapor deposition
4. Selective TiSi2 deposition with no silicon substrate consumption by rapid thermal processing in a LPCVD reactor
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1. Influence of carbon on the electron stimulated desorption from titanium silicide surfaces;Surface Science;2003-03
2. A New Quantitative Interpretation of Temperature-Programmed Desorption Spectra from Heterogeneous Solid Surfaces, Based on Statistical Rate Theory of Interfacial Transport: The Effects of Simultaneous Readsorption;Langmuir;1999-07-10
3. Optimization of selective TiSi2 chemical vapor deposition by mechanistic chemical kinetics;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1996-05
4. A Predictive Kinetic Model for the Chemical Vapor Deposition of TiSi2;Journal of The Electrochemical Society;1996-05-01
5. Surface Chemistry in the Chemical Vapor Deposition of Electronic Materials;Chemical Reviews;1996-01-01
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